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Description
SEM - Critical Dimension (CD) MeasurementConfiguration
No ConfigurationOEM Model Description
The Applied VeritySEM4i, designed for sub-32nm metrology by Applied Materials, boasts a remarkable 1.5nm SEM resolution, optimal detection efficiency, and powerful image processing. The system highlights Fleet Matching with 0.3nm precision, and with its advanced SEM column design and algorithms, it tackles challenges like ArF resist shrinkage and SADP metrology. VeritySEM4i maximizes throughput, offers Å-level matching accuracy, and diminishes the need for multiple CD-SEM tools in fabs, resulting in boosted productivity and cost savings. Additionally, features like the Offline Recipe Generator streamline recipe creation, while OPC|CheckMax facilitates the automation of the OPC mask qualification process for sub-32nm chipmakers. Ultimately, VeritySEM4i encapsulates Applied Materials' vision to consistently innovate in the metrology and inspection industry.Documents
No documents
CATEGORY
CD-SEM
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
71316
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
VeritySEM 4i
CATEGORY
CD-SEM
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
71316
Wafer Sizes:
12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
SEM - Critical Dimension (CD) MeasurementConfiguration
No ConfigurationOEM Model Description
The Applied VeritySEM4i, designed for sub-32nm metrology by Applied Materials, boasts a remarkable 1.5nm SEM resolution, optimal detection efficiency, and powerful image processing. The system highlights Fleet Matching with 0.3nm precision, and with its advanced SEM column design and algorithms, it tackles challenges like ArF resist shrinkage and SADP metrology. VeritySEM4i maximizes throughput, offers Å-level matching accuracy, and diminishes the need for multiple CD-SEM tools in fabs, resulting in boosted productivity and cost savings. Additionally, features like the Offline Recipe Generator streamline recipe creation, while OPC|CheckMax facilitates the automation of the OPC mask qualification process for sub-32nm chipmakers. Ultimately, VeritySEM4i encapsulates Applied Materials' vision to consistently innovate in the metrology and inspection industry.Documents
No documents