TEL / TOKYO ELECTRON

EXPEDIUS

UW-8000

The EXPEDIUS™ + is designed for 45nm and beyond technology node and has improved upon its predecessor in both performance and productivity. The configuration of the chemical treatment tanks, pure water rinse tanks, and dryer has been optimized to support FEOL clean, which requires particularly stringent process performance. Standard installation of the new SD2 dryer enables significant reduction of 45nm size or less micro-particles. The new SD2 which has been improved from TEL's original IPA dry module decreases the surface tension and prevents pattern destruction of vulnerable structures on the wafer. Furthermore the EXPEDIUS™ + provides high throughput and excellent productivity through a new wafer transportation system with smaller footprint. In addition, its unique batch-formation software option enhances process efficiency regardless of wafer quantity and processing position.

EXPEDIUS +

UW300Z

A state-of-the-art wet cleaning tool dedicated to FEOL surface preparations such as Pre-Gate Oxidation Clean, Pre-Metal Clean and Post-Ash Clean. It has the smallest footprint of all TEL wet cleaning tools, and has a higher throughput associated with advanced new dryer SD2.

UW-200Z

UW-300

The EXPEDIUS™ -i is the latest auto wet station succeeding from the EXPEDIUS™ +, a platform featuring further improvements in process performance and productivity. The system has a highly cost effective solution designed for 45nm and beyond technology node for semiconductor manufacturing. The EXPEDIUS™ -i achieved a throughput of 1,000 wafers per hour (a 150% increase compared with the previous model), high productivity, and low Cost of Ownership. Implementation of the chemical treatment and pure water rinse tanks, well-optimized dryer module improves its cleaning and resist stripping performance significantly. The system realized greatly improvement both etch shape control and process stability for the selective etch process. Furthermore, in order to suppress pattern collapse of vulnerable structures, advanced dryer contributes to reduce processing time drastically and collaborate with optimum sequencing, the system achieved shortened throughput times and the highest level of cost performance in the industry.

TEL / TOKYO ELECTRON

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Top TEL / TOKYO ELECTRON Wet Stations / Wet Chemistry Process

EXPEDIUS

15 Listings

UW-8000

8 Listings

EXPEDIUS +

8 Listings

UW300Z

5 Listings

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