Hitachi High-Tech offers a range of advanced industrial equipment solutions for assembly and processing machines used in the production of lithium batteries, auto parts and advanced film. Also offered R&D equipment necessary for the development of FC, organic materials, and catalyst materials.

The S-4700 Type I is a cutting-edge electron microscope with remarkable features. It offers high-resolution imaging at low accelerating voltages, ensuring a guaranteed resolution of 2.1 nm at 1 kV. Routine microscopy is made convenient with a long working distance of 12 mm, allowing sample exchange via an airlock without the need for repositioning. At 15 kV, the microscope maintains a high resolution of 1.5 nm. Additionally, it enables a sample tilt of 45 degrees without altering the working distance and offers a high X-ray take-off angle of 30 degrees with the sample normal to the beam. The instrument boasts an integrated electron detector for both secondary electrons (SE) and backscattered electrons (BSE), allowing operators to choose the best imaging mode for their samples. With complete column setup controlled through a computer interface, users can effortlessly switch between ultra-high-resolution mode and analysis mode. The unique objective lens design permits simultaneous use of YAG-type BSE and EDX detectors, enhancing imaging versatility.

HITACHI

S-4700 I

S-5000

The S-4500 with a semi-in-lens type objective lens and cold field emission electron source suited to high resolution microscopy that was well received in the market. 

S-4500

Field Emission Scanning Electron Microscope

S-4800 II

The S-5500, Immersion Lens system which generates the highest resolution images in the world(*1)(0.4nm at 30kV. The S-5500 have improved performance over that of its predecessor, the S-5200. [Main features of S-5500] (1) The world’s highest resolution, 0.4 nm at 30 kV, achieved by the use of a new electron optics system (as of October 2004). (2) New BF (bright field)/ DF (dark field) Duo STEM (scanning transmission electron microscopy) detector allows simultaneous display of BF and DF STEM images. In DF STEM mode, this detector is capable of providing images with variable detection angles. This new detection system greatly extends the usage of low accelerating voltage STEM at 30 kV.

S-5500

HITACHI S 4700 II is a SEM & TEM system. The S 4700 II has standard secondary electron detector (SE), a backscatter electron detector (BSD) and a Gatan MonoCL cathodoluminescence detector (CL). The BSD is sensitive to slight energy variations occurring when a high energy electron scatters off the nucleus of an atom. This sensitivity allows the BSD to map out variations in the densities of the sample. The CL measures photons released by the sample as it interacts with the electron beam and uses the information gathered from these photons to conduct elemental analysis.

S-4700 II

S-3400N

The S-4800 is an advanced Field Emission Scanning Electron Microscope (FE-SEM) that builds upon the proven performance of its predecessors, the S-4700 and S-5200. With beam deceleration technology, it achieves an impressive resolution of 1.4 nm at 1 kV and 1.0 nm at 15 kV. The microscope features a semi-in-lens detector design, allowing for the examination of large samples without compromising ultra-high resolution at low accelerating voltages. The innovative objective lens design incorporates Hitachi's Super ExB filter technology, which effectively separates pure secondary electrons (SE), compositional SE, and backscattered electron (BSE) signals. With a specimen diameter of 200 mm and a 5-axis motorized eucentric stage, it offers exceptional sample accommodation and positioning capabilities. The S-4800 is compatible with optional accessories such as Energy Dispersive X-ray Spectrometer (EDX) and Electron Backscatterted Diffraction Pattern (EBDP) systems, making it suitable for a range of ultra-high resolution applications in fields like semiconductor research, materials studies, and nanotechnology.

S-4800

S-3000N

RS 5500

200 kV dedicated STEM for semiconducting industry, materials science and biological science.

HD-2300

S-5200

S-4160

The RS-4000 performs at a high throughput of 1,200 DPH (defects per hour), which is about 3 times faster than the conventional model, and performs defect review at a high speed and high defect capture rate thereby improving image resolution (3 nm) and enhancing image processing. Combined with ADC (automatic defect classification) to identify killer defects, the tool produces data directly linked with yield enhancement in a short time. Furthermore, the newly added function of tilt image observation by tilting the electron beam enables the tool to generate more defect information.

RS-4000

The "TM-1000" allows for stereoscopically morphological observation with high resolution and a greater depth of focus which are not available with an optical microscope. The "TM-1000" uses backscattered electrons (BSE) for image observation.

TM-1000

S-4000

S-4100

The S-3500N has all the standard features of the S-3000N, but benefits from a chamber that can accept samples up to 8" in diameter, which also allows both EDX and WDX spectrometers to be fitted simultaneously. The EDX spectrometer can be fully integrated with Hi-Mouse option, which allows a single mouse and keyboard operate both the SEM and EDX system. The S-3500N has a high density frame memory of up to 2560 x 1920 pixels and an integral image processing, management and archiving system.

S-3500N

WA 200

S-3700N is designed as a new series of Tungsten-type VP-SEM to accommodate sample diameters up to 300mm using a new large specimen chamber and a large specimen stage. Moreover, simultaneous accommodations of accessory attachments for EDX, WDX and EBSP (*1) analyses are possible at optimized analytical geometry. The specimen stage has a wide traverse range for observation of sample areas up to 203mm diameter and up to 110mm height with EDX and WDX analysis.

S-3700N

WA 1200

S-4500 II

 High-speed In-line AFM System for 45-nm Node LSIs.

WA3300

FB-2100

S-3000H

FIB-SEM systems have become an indispensable tool for characterization and analysis of the latest technologies and high performance nano-scale materials. An ever-increasing demand for ultrathin TEM lamellas without artifacts during FIB processing require the best in ion and electron optics technologies.
Hitachi's NX2000 high performance FIB and high resolution SEM system with its unique sample orientation control* and triple beam* technologies, supports high throughput, and high quality TEM sample preparation for cutting edge applications.
* Option

NX2000

S-2500

S-7000

CV4000

The Hitachi S-4300 E/N (FESEM), with guaranteed 1.5 nm resolution at 15 kV (5.0 nm at 1.0 kV), combines both high resolution and variable pressure into a single instrument.

S-4300

The Hitachi NE4000 nanoEBAC is an electron beam based probing system for electrical characterization and EBAC analysis and imaging of microelectronic device interconnects, materials, and components.

NE4000

The HD-2700 is an 80-200 kV field-emission-gun scanning transmission electron microscope (STEM) with secondary electron (SE) imaging capability. Bulk and surface structures of a specimen can be imaged simultaneously. With the option for a probe-forming aberration corrector, ultra-high resolution can be achieved for both STEM and SE imaging. The Hitachi corrector minimizes the user's effort in doing aberration correction. Large solid-angle EDS* and atomic-spatial-resolution EDS* and EELS spectrum imaging* are enabled.

HD-2700

S-2600H

Entry level model with Lower in-chamber/Upper in-lens (Dual) SE detectors.

SU8010

As the successor to the TM-1000, the TM3000 offers a dramatic improvement in all the features of the earlier device, including its compact size, ease of operation, and magnification. Through more attention to compact design, the surface area required for the microscope has been reduced by roughly 20%. The operation of the TM3000 has also been simplified thanks to auto start, auto focus and other automated onboard functions. The most groundbreaking achievement of the new device, however, is that magnification has been expanded to 30,000X, enabling even higher-magnification observation. Moreover, the TM3000 can be easily controlled and samples viewed through a connected PC, making it simple for even first-time electron microscope users to operate.

TM-3000

S-6780

HF-2000	

The RS-3000 is a high-speed review tool that achieves a defect review speed of 600 DPH (defects per hour) with teaching-free automatic defect classification capability.

RS-3000

RS-6000

S-5000H

SU8200

FB-2000A

H-7000

I-5320N

Analytical UHR Schottky Emission Scanning Electron Microscope
Model SU-70 is a new-concept SEM, incorporating Hitachi’s field proven semi-in-lens technology for ultra-high resolution with a Schottky electron gun. It features not only ultra-high resolution (1.0nm/15kV, 1.6nm/Kv (*)) but also reduced charge-up imaging, compositional-contrast imaging, and ultra-low voltage imaging derived from Hitachi’s highly reputed Super ExB filter technology. The Schottky electron gun enables a wide variety of analytical capabilities due to its high probe current (100nA). 

SU-70

S-530

S-3200H

S-2300

The SU8600 brings in a new era of ultrahigh-resolution cold-field emission scanning electron microscopes to the long-standing Hitachi EM lineup. This revolutionary CFE-SEM platform incorporates multifaceted imaging, automation, increased system stability, efficient workflows for users of all experience levels, and more.

SU8600

The newly developed FIB-SEM system from Hitachi, the NX9000 incorporates an optimized layout for true high-resolution serial sectioning to tackle the latest demands in 3D structural analysis and for TEM and 3DAP analyses. The NX9000 FIB-SEM system allows the highest precision in material processing for a wide range of areas relating to advanced materials, electronic devices, biological tissues, and a multitude of other applications.

NX9000

S-3200N

The SU5000 FE-SEM has forever changed SEM operations. Ground-breaking computer-assisted technology from Hitachi, referred to as the EM Wizard, offers a new level of SEM operation and control. Expert or novice, the result is now the same: Highest quality nano-scale images at everyone's fingertips!

SU5000

The HT7800 RuliTEM is a 120 kV transmission electron microscope (TEM) with multiple lens configurations, including a standard lens for unsurpassed high contrast and a class-leading HR lens for high resolution.
This breakthrough in advanced innovative design allows for highly efficient workflows and many specialized applications. It represents the cutting-edge solution for modern TEM analyses.

HT7800

AFM100 Plus
Multi-compatible system that achieves both basic AFM performance and improved operability
A compact multi-model equipped with an anti-vibration table with a stand and a microscope with a zoom function as standard, and can also support environmental control such as air, liquid, and heating.
*Can be expanded to AFM100 Pro.

AFM100 Plus

The TM3030Plus Tabletop Microscope ("TM" for short) is designed to observe microstructure of specimen surface prepared specifically for the TM, using electron beam accelerated to 5 or 15kV as a light source.

TM3030 Plus

The TM4000 Series features innovation and cutting-edge technologies which redefine the capabilities of a tabletop microscope. This new generation of the long-standing Hitachi tabletop microscopes (TM) integrates ease of use, optimized imaging, and high-image quality, while maintaining the compact design of the well-established Hitachi TM Series products. Experience the new dimension of tabletop microscopes with the Hitachi TM4000 II and TM4000Plus II.

TM4000II

Lower/Upper/Top (Triple) SE detectors to extend the capability to collect secondary electrons and low energy backscattered electrons This novel, ultrasensitive detection system allows high efficiency, simultaneous multi-signal imaging and energy filtering.

SU8020

The HT7800 RuliTEM is a 120 kV transmission electron microscope (TEM) with multiple lens configurations, including a standard lens for unsurpassed high contrast and a class-leading HR lens for high resolution.
Resolution: 0.14 nm (Off-axis, 120 kV）0.19 nm (On-axis, 120 kV）
Maximum magnification: x1,000,000

HT7830

RS-5000

Visual inspection system I-6300, a high-sensitivity high-speed tool for application to 45-nm node and beyond next-generation semiconductor device fabrication. 

I-6300

Scanning electron microscopes (SEMs)—instruments for observing the fine structure of sample surfaces—are widely used in all fields of industry, particularly in biotechnology and material sciences. The TM4000 series of tabletop microscopes is a low-vacuum SEM with a thermal electron gun that retains the key strengths of their predecessors in the TM3000 series while boasting smaller instrument footprints and improved ease of use, making SEM observations easy even for users who have never before worked with an electron microscope. The architecture of the TM4000 series reflects the vast amount of feedback we have received from tabletop-microscope users in the fields of manufacturing and quality control, and the design of the instruments reflects a central underlying conceptual theme: helping users streamline and facilitate routine operations. New features include (a) SEM-MAP capability, in which images captured by a camera mounted inside an evacuated sample chamber are used for sample navigation, allowing users to move to desired observation regions with just a single click of the mouse, and (b) report-preparation software (a standard feature available on all instruments in the series ) allowing users to generate reports of observed images following an observation session. Moreover, similar to the TM3000 series, all instruments in the TM4000 series are equipped with a semiconductor backscattered-electron detector as a standard feature, while the TM4000 PLUS model further boasts a high-sensitivity low-vacuum secondary-electron detector (UVD). The TM4000 series expands the universe of tabletop microscopy, empowering more users than ever before to unleash the creativity of their innovations.

TM4000

High-Speed Defect Review SEM
Wafer size: Φ300mm (SEMI standard V notched wafer)

CR6300

As a new brand of FE-SEMs, the Regulus series lineup comprises four models: the Regulus8100, Regulus8220, Regulus8230, and Regulus8240, all of which extend the functions of the SU8200 series with the use of a common platform.

With optimized electron optical systems, the new Regulus series features resolutions down to 0.7 nm in the Regulus8220/8230/8240 models and 0.8 nm in the Regulus8100 model.

The Regulus series employs a novel cold-field-emission (CFE) gun optimized for high-resolution imaging at low accelerating voltages. This CFE gun makes it possible to magnify high-resolution images up to 2 million times,*1 compared with 1 million times in previous models.

User-support functions have also been enhanced so that the advanced performance of the series can be fully leveraged, including functions to assist the operation of the signal detection system for analyzing diverse types of materials, as well as device-maintenance functions.

REGULUS8240

120 kV automated TEM for biological and beam-sensitive materials.

H-7650

The HD-2000 offers high resolution of 0.24 nm and a maximum magnification of 2 million times, yet offers the simplicity of operation of an SEM.

HD-2000

WA 1300

AFM5400L

FE-SEM
The new SU8000 features a top detector along with a semi-in-lens type of objective lens. This technology is a further advance on the popular upper backscattered electron detector used in the S-5500. By combining the top detector with the conventional upper detector technology, Hitachi has now developed a new signal detection system for optimum contrast visualization of signals, generated from the sample. These signals include secondary electrons, low-angle backscattered electrons and high-angle backscattered electrons, which are acquired for observation of surface structures.

SU8000

The S-4300SE allows a probe current of 25 nA (maximum) at 20 kV. It is useful for analytical and other applications that require a large probe current. 

S-4300SE

S-800

The AFM5100N offers both Optical Lever System and Self-detection System. Optical Lever System supports electromagnetic and mechanical modes and is compatible with environmental controls, such as in-liquid and temperature control. You can achieve multiple measurements without exchanging the cantilever holder, since it can cover all measurements mode except STM and in-liquid imaging. Self-detection System simplifies difficult SPM operations. Its self-sensing cantilever has a sensor on itself, therefore this detection method does not require laser alignment. These two detection systems can be easily swapped by plugging in/out their cables to the main SPM unit.

AFM5100N

the advanced technologies incorporated into the SU-1500 provide a guaranteed secondary electron resolution of 3.0nm (high vacuum mode) and a guaranteed backscattered electron resolution of 4.0nm (variable pressure mode).

SU1500

REGULUS8100

the SU8040 that features a newly developed Regulus Stage. The Regulus stage has the capability that can be operated smoothly even at ultra high resolution. The Regulus stage has adopted a high reliable conventional motor drive, but the capability has been greatly improved thanks to the newly developed motor drivetrain. Now the Regulus stage can achieve seamless stage operation and high throughput observation without any stress.

SU8040

AFM100
A compact desktop system that does not compromise on basic AFM performance
Entry model with a space-saving tabletop anti-vibration table
*Expandable to AFM100 Plus / AFM100 Pro

AFM100

S-6600

is the top-of-the-line SEM equipped with cold FE electron source and in-lens objective lens with least aberration, and achieves the world's highest SE resolution of 0.4nm. In addition to high resolution STEM with 0.34nm resolution, EELS and diffraction that are usually considered difficult for SEM can also be supported.

The SU9000 is HITACHI's new premium SEM. It features unique electron optics, with the sample positioned inside a gap between the upper and lower parts of the objective lens pole piece. This so-called true in-lens concept - combined with the next generation of HITACHI's cold field emission technology - guarantees the highest possible system resolution (SE resolution 0.4 nm @ 30 kV, 1.2 nm @ 1 kV without requiring beam deceleration technology [0.8nm with beam deceleration]) and stability.

SU9000

AFM5200S

Large chamber/large stage model for large or multiple samples.

SU8030

300 kV high-resolution TEM for materials and biological sciences.

H-9500

The Model RS-4500 is an enhanced tool based on the RS-4000, with the added function of intelligent automatic review point sampling for better review efficiency. When handling a vast amount of defect review data, the RS-4500 provides equivalent review efficiency to all defect sampling by sampling fewer defects.

RS-4500

AFM5100M

Performance & Power in a Flexible Platform
Hitachi High-Tech's scanning electron microscopes SU3800/SU3900 deliver both operability and expandability. The operator can automate many operations and efficiently utilize their high performance. The SU3900 is equipped with a large multipurpose specimen chamber to accommodate observation of large samples.

SU3800

S-2700

This FPD photomask defect repair system uses focused ion beam (FIB) technology and supports large scale photomasks.
A rotation mechanism inside the chamber minimizes an installation area.

MR8000

Hitachi's unique 200 kV aberration-corrected TEM/STEM: the perfect harmony of imaging resolution and analytical performance 0.078 nm spatial resolution in STEM is achieved together with high specimen-tilt capability and large solid angle EDX detector(s), all in a single objective lens configuration.
The HF5000 builds on features from Hitachi HD-2700 dedicated STEM including Hitachi's own fully automated aberration corrector, symmetrical dual SDD EDX and Cs-corrected SE imaging. It also incorporates the advanced TEM/STEM technologies developed in the HF series. Integrating these accumulated technologies into a new 200 kV TEM/STEM platform results in an instrument with an optimum combination of sub-Å imaging and analysis, as well as the flexibility and unique capabilities to address the most advanced studies.

HF-5000

CG 6450T

I 5320

S-3400N II

The SU8200 opens a new gateway for SEM analysis. The ultimate SEM electron source now offers high signal to noise )S/N0 and uncompromising resolutions with beam current and stability, which is critical for analytical solutions. The robust SU8200 series supports a wide variety of applications within material research ‘ development and industrial quality control environments 

SU8220

-SU8700: The SU8700 brings in a new era of ultrahigh-resolution Schottky field emission scanning electron microscopes to the long-standing Hitachi EM line-up. This revolutionary FE-SEM platform incorporates multifaceted imaging, high-probe current, automation, efficient workflows for users of all experience levels, and more.

SU8700

REGULUS8230

The MI4050 High-Performance Focused Ion Beam System is equipped with new optics and provides the world-leading SIM imaging resolution and high-definition TEM sample preparation with improved imaging resolution at low kV. The MI4050 accommodates a variety of applications such as cross-section observation, circuit modification, vector scan processing, nano-micro patterning, nano molding, and 3D nano fabrication using deposition function.

MI4050

The FlexSEM 1000 II VP-SEM combines innovative technological features with an intuitive interface, to deliver adaptability and flexibility in a powerful, automated, lab-friendly package. Cutting-edge technology and circuitry provides unrivaled imaging performance, even in variable-pressure environments, a feature previously only available in a full-sized SEM. This SEM runs on clean energy for an economical analytical tool, without compromising performance.

FlexSEM 1000 II

TM-3030

Performance & Power in a Flexible Platform
Hitachi High-Tech's scanning electron microscopes SU3800/SU3900 deliver both operability and expandability. The operator can automate many operations and efficiently utilize their high performance. The SU3900 is equipped with a large multipurpose specimen chamber to accommodate observation of large samples.



SU3900

Hitachi High-Tech Corporation has developed the Ethos NX5000 high-performance FIB(*1)-SEM(*2), which combines a high-intensity cold-cathode field emission electron gun technology with a newly developed magnetic/electrostatic compound lens (or dual-mode lens).

The Hitachi Ethos FIB-SEM incorporates the latest-generation FE-SEM with superb beam brightness and stability. Ethos delivers high-resolution imaging at low voltages combined with ion optics for nanoscale precision processing.

NX5000

S-2600N

REGULUS8220

The HT7800 RuliTEM is a 120 kV transmission electron microscope (TEM) with multiple lens configurations, including a standard lens for unsurpassed high contrast and a class-leading HR lens for high resolution.
Resolution: 0.14 nm (Off-axis, 120 kV）
Maximum Magnification: x800,000


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