NS300 is a 300mm wafer scrubber system which enables each side of wafer surface clean with high reliability and stability. Its Atomized Spray 2 (AS2) and bevel brushes deliver high quality cleaning process by reducing surface damage during process.

TEL / TOKYO ELECTRON

NS300

SS4 is a high reliable scrubber processing system for 100/150/200mm wafers which has years of experience in wafer surface clean both front face and backside. The system reduces surface damage during process with Atotmized Spray 2 (AS2) developed for a state-of-the-art 300mm scrubber system.

Wafer size (mm): 300
Throughput (wph): 320
Process: DIW scrubber
Substrates: Si, Glass
Dry method: Spin, N2 blower
Nozzle type: AS2, Brush

NS300+

The superior reliability and stability of the NS300+ concept has been carried on into the new NS300+ HT. It is an improved, and more productive scrubber. As with the previous system, it is equipped with an 8 process spin chamber and achieves a throughput of up to 500 wafers per hour (a more than 150% increase compared with the previous system) with a footprint equivalent to that of the previous system.

NS300+ HT

The features of the NS300+ HT process module - renowned for its reliability and stability - have been carried on into the new NS300Z, a more productive scrubber. The system has an 8-process spin chamber and achieves a throughput of up to 1,000 wafers per hour (200% of the previous system). Unique function is also equipped to realize the prevention of contamination during wafer transport, while keeping high productivity. In addition, the Atomized Spray 2 (AS2) and brushes succeeding from the previous system was improved. The NS300Z provides a wide range of scrubber clean process with high productivity even in cutting-edge device manufacturing.

TEL / TOKYO ELECTRON

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