PE3061D

PE 2061S

The PE 3061 is a small batch reactor with reduced wafer load to improve quality and short cycle time to maintain a remarkable throughput. 

PE 3061

Introducing the PE 2061 S Reactor: A field-proven epitaxial wafer production solution, specially designed for severe applications like PowerMos, Discrete, IGBT, and special devices up to 250 microns per 200 Ohm x cm. With its compact barrel design, atmospheric and reduced pressure process capabilities, and one-pass gas flow low frequency inductive heating, it's the top choice for leading semiconductor manufacturers worldwide. Experience efficient wafer handling in a class 10 environment, accommodating 4'', 5'', 6'', and 8'' wafers. Optimize your Clean Room space with its through the wall mounting configuration.

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PE3061D

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PE 2061S

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2061S

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PE 3061

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