Description
missing : chamber, coverConfiguration
No ConfigurationOEM Model Description
The CANON FPA-2500i2 is a stepper system that can be used with a 6” reticle wafer size. It has a numerical aperture of 0.54 / 0.45 and an image field of 22 mm [(X)17mm x (Y)26mm]. The CANON FPA-2500i2 stepper has a printing wavelength of i-line (365 nm) and a resolution of 0.45 μm. It has an illumination lamp of 1.5 kW super-high-pressure mercury and an illumination uniformity of ≤ 1.2 %. It also has alignment modes of TTL Off-Axis He-Ne TV and TTL Off-Axis Broad Band TV with an alignment light source of He-Ne laser (633 nm) and Halogen lamp. Its alignment accuracy is ≤ 0.1 μm (mean + 3 σ) and its throughput is ≥ 52 wafers / hour (8”, 60 shot).Documents
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CANON
FPA-2500i2
Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
103995
Wafer Sizes:
8"/200mm
Vintage:
1994
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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CANON
FPA-2500i2
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
103995
Wafer Sizes:
8"/200mm
Vintage:
1994
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
missing : chamber, coverConfiguration
No ConfigurationOEM Model Description
The CANON FPA-2500i2 is a stepper system that can be used with a 6” reticle wafer size. It has a numerical aperture of 0.54 / 0.45 and an image field of 22 mm [(X)17mm x (Y)26mm]. The CANON FPA-2500i2 stepper has a printing wavelength of i-line (365 nm) and a resolution of 0.45 μm. It has an illumination lamp of 1.5 kW super-high-pressure mercury and an illumination uniformity of ≤ 1.2 %. It also has alignment modes of TTL Off-Axis He-Ne TV and TTL Off-Axis Broad Band TV with an alignment light source of He-Ne laser (633 nm) and Halogen lamp. Its alignment accuracy is ≤ 0.1 μm (mean + 3 σ) and its throughput is ≥ 52 wafers / hour (8”, 60 shot).Documents
No documents