Axcelis acquired Fusion Systems Corporation in August 1997.
Fusion is a leading worldwide supplier of single-wafer ashers and photostabilizers used in the fabrication of advanced semi- conductor devices.

AXCELIS / FUSION

200 ACU 

300mm photoresist strip system for front-end of line strip applications.

RAPIDSTRIP 320

The FusionES3 is a 300mm plasma asher with dry strip capabilities, designed for post-implant and post-etch process steps. It has a flexible process architecture, making it suitable for conventional and dual damascene process flows. It provides dry resist and residue removal, and its elevated ash rate delivers high throughput and productivity. The tool is designed to run oxidizing, fluorinated, and reducing chemistries. Its unique dual-chamber platform enables dry strip and residue removal to be performed within a single chamber, increasing productivity and reducing the system footprint.

FUSION ES3

200MCU

RAPIDSTRIP 210

GEMINI GPL

INTEGRA

The new FusionES3i system supports nearly all dry-strip requirements for copper, low-k dielectric, deep trench and vias, and other applications in a single tool.
Second generation 300mm photoresist strip system.

FUSION ES3i

The FusionGemini Plasma Asher ES (Enhanced Strip) is a device designed for advanced IC manufacturing. It eliminates the need for “wet” chemical processing to remove post-strip residues, providing a “dry” solution through the use of specialized gas chemistries. This results in dry strip processes that only require a follow-on DI water rinse. The FusionGemini ES can perform resist strip and residue removal in the same chamber, providing high throughput and rapid parallel processing. It also provides the lowest damage of any residue removal-capable plasma asher in the industry, and uses radiant heating for multi-temperature stripping. The FusionGemini ES uses O2, H2:N2, CF4, and custom gases, and is a 200mm photoresist strip system.

GEMINI ES

Second generation 200mm photoresist strip system for back-end of line stripping of photo resist.

RADIANTSTRIP 220

ES3Lk is Axcelis Technologies' 300mm resist stripping system specifically designed to support the integration of low-k dielectric materials.

FUSION ES3Lk

GEMINI GES

200mm photoresist strip system for front-end of line strip applications.

RAPIDSTRIP 220

GEMINI 2

RADIANTSTRIP 320Lk

The platform is ideally suited to the demands of high-volume memory manufacturing, where the need for tool reliability and versatility is at a premium. Axcelis designed the RadiantStrip 320 for dependability and productivity in high-volume, low cost-of-ownership manufacturing environments. The machine offers a modular and scalable platform for bulk photoresist strip, advanced polymer removal and complete dry clean processes in the same chamber.

RADIANTSTRIP 320

The FUSION GEMINI GPL MCU202 is a plasma asher used in semiconductor manufacturing processes. Its compact footprint measures approximately 1.14 meters x 1.6 meters (3.75 feet x 5.3 feet). The primary application for this system is bulk strip, which involves removing material layers from the surface of semiconductor wafers. The asher utilizes a downstream microwave plasma as the process source, allowing for efficient and controlled material removal during the strip process. 

AXCELIS / FUSION

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200 ACU

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200MCU

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