Description
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Software Version : Ver.6.07 System Controller is Model 780 The last PM date is 2016/09/24 Off -line date is 2017/11/06 Can produce wafers as is All cables are present Platform Type is TELINDY PLUS I-RAD Process Type is Gate Oxide/SiO2 Temperature Range is Mid Temp 500-800 C Tokyo Electron Ltd. (TEL) TELINDY Plus IRADOxide Wafer Handling : Wafer Type is 300 mm Carrier Type is 25 slot Carrier Stage Capacity is special WTU Type is 1+4 Edge Grip Production Wafers qty are 100 Boat Operation is 1 Boat Type Gas Panel Configuration : MFD Make is ADVANCED ENERGY Gas MFC Model MFC Size N2 MFC-NX 50 SLM O2 MFC-O1 20 SLM HF MFC-XF1 5 SLM N2 MFC-N1 10 SLM N2 MFC-N2 10 SLM N2 MFC-N3 5 SLM N2 MFC-N4 10 SLM N2 MFC-NL 1000 SLM N2 MFC-NBS 400 SLM N2 MFC-NR 500 SCCM Reactor Configuration : Quartz Material is Electric Fused Quartz Provide is TEL Process TUBE is I Red TUBE TUBE Sealing is special O-ring Boat Type is 117 slot Boat Material is Quartz Pedestal Type is Quartz Auto shutter is shutter purge type Edwards-IXH3030T Vacuum pump is includedOEM Model Description
TELINDY PLUS™ is a cutting-edge thermal processing technology that combines the best features of the TELFORMULA™ minibatch system and the previous generation TELINDY™ platform. It offers improved process performance and productivity, with new enhancements such as improved maintenance access, dry gas chamber cleaning, and low O2 environment loading area control. These features contribute to yield increases by managing small particles more effectively. The highest levels of productivity are achieved by combining a 125 wafer load size with TEL’s FTPS™ responsive heater and a dual boat system option. TELINDY PLUS™ can be used for a wide range of applications, from traditional silicon treatments to leading edge ALD processes and radical oxidation. It represents the convergence of demonstrated experience and advanced technology, making it a powerful tool for thermal processing.Documents
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TEL / TOKYO ELECTRON
TELINDY PLUS
Verified
CATEGORY
Furnaces / Diffusion
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
50246
Wafer Sizes:
12"/300mm
Vintage:
2013
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Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
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TEL / TOKYO ELECTRON
TELINDY PLUS
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
50246
Wafer Sizes:
12"/300mm
Vintage:
2013
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Software Version : Ver.6.07 System Controller is Model 780 The last PM date is 2016/09/24 Off -line date is 2017/11/06 Can produce wafers as is All cables are present Platform Type is TELINDY PLUS I-RAD Process Type is Gate Oxide/SiO2 Temperature Range is Mid Temp 500-800 C Tokyo Electron Ltd. (TEL) TELINDY Plus IRADOxide Wafer Handling : Wafer Type is 300 mm Carrier Type is 25 slot Carrier Stage Capacity is special WTU Type is 1+4 Edge Grip Production Wafers qty are 100 Boat Operation is 1 Boat Type Gas Panel Configuration : MFD Make is ADVANCED ENERGY Gas MFC Model MFC Size N2 MFC-NX 50 SLM O2 MFC-O1 20 SLM HF MFC-XF1 5 SLM N2 MFC-N1 10 SLM N2 MFC-N2 10 SLM N2 MFC-N3 5 SLM N2 MFC-N4 10 SLM N2 MFC-NL 1000 SLM N2 MFC-NBS 400 SLM N2 MFC-NR 500 SCCM Reactor Configuration : Quartz Material is Electric Fused Quartz Provide is TEL Process TUBE is I Red TUBE TUBE Sealing is special O-ring Boat Type is 117 slot Boat Material is Quartz Pedestal Type is Quartz Auto shutter is shutter purge type Edwards-IXH3030T Vacuum pump is includedOEM Model Description
TELINDY PLUS™ is a cutting-edge thermal processing technology that combines the best features of the TELFORMULA™ minibatch system and the previous generation TELINDY™ platform. It offers improved process performance and productivity, with new enhancements such as improved maintenance access, dry gas chamber cleaning, and low O2 environment loading area control. These features contribute to yield increases by managing small particles more effectively. The highest levels of productivity are achieved by combining a 125 wafer load size with TEL’s FTPS™ responsive heater and a dual boat system option. TELINDY PLUS™ can be used for a wide range of applications, from traditional silicon treatments to leading edge ALD processes and radical oxidation. It represents the convergence of demonstrated experience and advanced technology, making it a powerful tool for thermal processing.Documents
No documents
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