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TEL / TOKYO ELECTRON ACT M
    Description
    Coater
    Configuration
    No Configuration
    OEM Model Description
    The CLEAN TRACK™ ACT™ M incorporates three separate high-performance application modules: photomask developer, resist coater, and PEB (Post-Exposure Bake) oven. The system provides sophisticated process control and techniques in the photomask manufacturing process to meet the advanced requirements from industry for OPC(Optical Proximity Correction), phase shifting, and the use of chemical amplification resists. The system extends TEL's long-standing semiconductor and FPD coating and developing technology, and achieves high reliability by adopting CLEAN TRACK™ ACT™ technology.
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    TEL / TOKYO ELECTRON

    ACT M

    verified-listing-icon

    Verified

    CATEGORY

    Coaters & Developers
    Last Verified: 22 days ago
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    31268

    Wafer Sizes:

    Unknown

    Vintage:

    2006

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    Transaction Insured by Moov
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    TEL / TOKYO ELECTRON ACT M
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    TEL / TOKYO ELECTRON ACT M
    TEL / TOKYO ELECTRONACT MCoaters & Developers
    Vintage: 0Condition: Used
    Last Verified22 days ago

    TEL / TOKYO ELECTRON

    ACT M

    verified-listing-icon

    Verified

    CATEGORY

    Coaters & Developers
    Last Verified: 22 days ago
    listing-photo-9dd41a572f6e45b79c3a1ce41b27ca02-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2046/9dd41a572f6e45b79c3a1ce41b27ca02/94d3f502df804a56bbff75df3e380478_e17a0355ed814cdaa0b90385734e46d5_mw.jpeg
    listing-photo-9dd41a572f6e45b79c3a1ce41b27ca02-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2046/9dd41a572f6e45b79c3a1ce41b27ca02/70db12be99794734ada66bce03563396_68b54a21d4324a00b831869ff220b50a_mw.jpeg
    listing-photo-9dd41a572f6e45b79c3a1ce41b27ca02-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2046/9dd41a572f6e45b79c3a1ce41b27ca02/fd0a42fad57f439ba65e66cd3a0ec21f_169bc9324b434ff58f2918c8abafbbac_mw.jpeg
    listing-photo-9dd41a572f6e45b79c3a1ce41b27ca02-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2046/9dd41a572f6e45b79c3a1ce41b27ca02/84f43bf54a5241de90876319610d1ef1_6911f546e62c42e797a7151de7ff40411105c_mw.jpeg
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    31268

    Wafer Sizes:

    Unknown

    Vintage:

    2006

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Coater
    Configuration
    No Configuration
    OEM Model Description
    The CLEAN TRACK™ ACT™ M incorporates three separate high-performance application modules: photomask developer, resist coater, and PEB (Post-Exposure Bake) oven. The system provides sophisticated process control and techniques in the photomask manufacturing process to meet the advanced requirements from industry for OPC(Optical Proximity Correction), phase shifting, and the use of chemical amplification resists. The system extends TEL's long-standing semiconductor and FPD coating and developing technology, and achieves high reliability by adopting CLEAN TRACK™ ACT™ technology.
    Documents

    No documents

    Similar Listings
    View All
    TEL / TOKYO ELECTRON ACT M
    TEL / TOKYO ELECTRON
    ACT M
    Coaters & DevelopersVintage: 2006Condition: UsedLast Verified: 22 days ago
    TEL / TOKYO ELECTRON ACT M
    TEL / TOKYO ELECTRON
    ACT M
    Coaters & DevelopersVintage: 0Condition: UsedLast Verified: 22 days ago