The CLEAN TRACK™ LITHIUS™ Series is the latest coater/developer equipped with high-technology succeeding from the CLEAN TRACK™ ACT™ series. The key concepts are extensibility to advanced processes, high throughput, reduced footprint, improved OEE (Overall Equipment Efficiency), and CoO (Cost of Ownership) reduction.

Successor to the ACT - 200mm or 300mm, more modules and faster throughput (150 wph).

TEL / TOKYO ELECTRON

LITHIUS

TEL / TOKYO ELECTRON MARK 7 is a Coater and Developer system that can process 8” Wafers.
100,150,200mm wafers, 90wph - system was enclosed for particle reduction.
The CLEAN TRACK™ Mark 7/8's was the innovative coater developer system for 5 to 8 inch wafers with further scaling and improved productivity. It inherited the concept of Mark V that released in 1989 as the top-end models. In addition, plus environment control technology which enables stable and excellent performance, The CLEAN TRACK™ Mark 7/8’s supports various type of manufacturing scene from research and development to volume production.

MARK 7

The CLEAN TRACK™ ACT™ 8 is 200mm coater/developer which enable stable, high-quality processing and smooth transition from R&D to volume production. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. In addition, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven.

First Generation ACT, successor to Mark Series <- 8 refers to 8 inch (200mm) wafers.

ACT 8

The CLEAN TRACK™ ACT™ 12 is 300mm coater/developer which enable stable, high-quality processing and smooth transition from R&D to volume production. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. In addition, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven.

Upgraded ACT to handle 12 inch (300mm) wafers.

ACT 12

A coater developer system for 5 to 8 inch wafers with further scaling and improved productivity. 
Final Mark coater, 100, 150, 200mm wafers, 90wph - system was enclosed for particle reduction.

The CLEAN TRACK™ Mark 7/8's was the innovative coater developer system for 5 to 8 inch wafers with further scaling and improved productivity. It inherited the concept of Mark V that released in 1989 as the top-end models. In addition, plus environment control technology which enables stable and excellent performance, The CLEAN TRACK™ Mark 7/8’s supports various type of manufacturing scene from research and development to volume production.

MARK 8

30 year old coater, generally 75,100,150mm wafers, 60wph - open system, improved throughput over Mark V.

MARK Vz

The CLEAN TRACK™ Mark-V realized various innovative technologies such as stacked clean oven module layout and high-speed wafer handling robotics, etc, so dramatically changed the concept of the conventional photoresist systems and set the worldwide standards for them.

30 year old coater, generally 75,100,150mm wafers, 60wph - open system.

MARK V

The next developed CLEAN TRACK™ Mark-II was able to transit to larger wafer size to 6 inches with advanced controller. Through multiple efforts like introducing in-line models with exposure tools the system’s continuous improvement involved higher productivity.

MARK II

CS 450

LITHIUS i+

The CLEAN TRACK™ ACT™ M incorporates three separate high-performance application modules: photomask developer, resist coater, and PEB (Post-Exposure Bake) oven. The system provides sophisticated process control and techniques in the photomask manufacturing process to meet the advanced requirements from industry for OPC(Optical Proximity Correction), phase shifting, and the use of chemical amplification resists. The system extends TEL's long-standing semiconductor and FPD coating and developing technology, and achieves high reliability by adopting CLEAN TRACK™ ACT™ technology.

ACT M

CLEAN TRACK™ LITHIUS Pro™ V incorporates all of the advanced technology of the proven CLEAN TRACK™ LITHIUS Pro™ V. It enables higher throughput, increases wafers per day, and improves overall equipment efficiency. Additionally, it also meets industry requirements for versatile lithography equipment capable of leading edge processes, including double patterning.

LITHIUS Pro V

The CLEAN TRACK™ LITHIUS Pro™ is a 300mm process coater/developer offering enhanced productivity and significantly decreased footprint. It supports advanced immersion lithography through innovative modules and integrated metrology for advanced process control solutions. Additionally, this platform improves upon the core track concepts of OEE (Overall Equipment Efficiency) and lower CoO (Cost of Ownership).

The TEL / TOKYO ELECTRON CLEAN TRACK LITHIUS PRO is Coaters and Developers system. The LITHIUS PRO can be used with 2” and 3” wafer size, 200 wph high throughputs with a small footprint.

LITHIUS Pro

TEL / TOKYO ELECTRON LITHIUS PRO-I is a Coaters and Developers system. the LITHUS PRO – I can be used with 12” wafer size.

LITHIUS Pro-i

CS 500

CLEAN TRACK™ LITHIUS Pro™ Z is TEL's most advanced 300mm coater/developer for the 10nm technology node and beyond. It incorporates user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications from next generation development to high volume mass production. 

LITHIUS Pro Z

CLEAN TRACK LITHIUS i

It enables higher throughput, increases wafers per day, and improves overall equipment efficiency. Additionally, it also meets industry requirements for versatile lithography equipment capable of leading edge processes, including double patterning.

LITHIUS Pro V-i

The CLEAN TRACK™ ACT™ 12 SOD is spin-on dielectric systems designed to coat, bake, and cure of low-k dielectric materials. Its innovative process modules provides optimally process for organic, inorganic, hybrid, and porous materials. In addition, CLEAN TRACK™ ACT™ 12 SOD equipped in-line curing, which had been traditionally performed in a furnace, by incorporation of high temperature hotplate processing in a low-oxygen environment.

ACT 12 SOD

The CLEAN TRACK™ ACT™ 8 SOD are spin-on dielectric systems designed to coat, bake, and cure of low-k dielectric materials. Its innovative process modules provides optimally process for organic, inorganic, hybrid, and porous materials. In addition, CLEAN TRACK™ ACT™ 8 SOD equipped in-line curing, which had been traditionally performed in a furnace, by incorporation of high temperature hotplate processing in a low-oxygen environment.

ACT 8 SOD

CLEAN TRACK™ LITHIUS Pro™ AP for 300mm wafer processing system incorporates fundamental concepts from the widely-installed CLEAN TRACK™ ACT™ 12, with increased focus on providing optimized hardware and processes to support advanced packaging, high viscosity, and spin-on hard mask applications. Additionally, this platform integrates the latest transfer system with alignment capability and compact spin modules from our leading edge CLEAN TRACK™ LITHIUS Pro™ Z to improve productivity, reliability, and yield. CLEAN TRACK™ LITHIUS Pro™ AP adopts key innovations from our CLEAN TRACK™ series, contributes to improve productivities and yields on advanced packaging and other key semiconductor operations.

LITHIUS Pro AP

The CLEAN TRACK™ Mark was the first domestic model of coater/developer for TEL which was based on the photoresist system developed and manufactured in US.

TEL / TOKYO ELECTRON

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