With its high resolution imaging and backscattered electron (BSE) technology, this metrology system helps chipmakers improve process development and device performance . AMAT’s VERITY SEM 2 boasts excellent system performance with an availability rate of 95% and PR success rate of 99.7%. Accelerating voltage ranges from 0.2 kV to 2.5 kV with extraction V up to 4 KV and its probe current reaches 5 pA - 500 pA. Configuration includes YAP detector, electron optics, field emission electron gun with thermal assistance, autostigmation module, open cassette ports (300 mm), central recipe database server, 3D Sidewall imaging, SEM autofocus, signal tower, central recipe database server, thermal video printer, alphanumeric printer, and operating console for standing or sitting.

Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

APPLIED MATERIALS (AMAT)

VERITYSEM 2

The electron optical system of the Model S-9260 CD-SEM has a 3-nm image resolution, which is applicable to lines/spaces and hole patterns of less than
0.1 µm. Figs. 2 and 3 show examples of observations of the model. It has formula-editor and beam-tilt observation functions
that enable detecting process variations early and controlling them easily.

Hitachi High-Tech offers a range of advanced industrial equipment solutions for assembly and processing machines used in the production of lithium batteries, auto parts and advanced film. Also offered R&D equipment necessary for the development of FC, organic materials, and catalyst materials.

HITACHI

S-9260A

The CG4000 also offers new advanced functions for the process applications. For example, a high-accuracy averaged CD (ACD) metrology function helps boost the repeatability and throughput. A line edge roughness (LER)*2 measurement function that has been promoted to be the industry standard contributes to the process monitoring. 

CG4000

The Hitachi S-9360 Advanced CD-Measurement SEM has been developed for the sub-100 nm process control of semiconductor devices. It is compatible with 200- and 300-mm wafers, ArF photoresist wafers, as well as other charge sensitive wafers. It has a new automated column alignment function and a new built-in Hitachi real-time process monitor, which keeps track of process conditions at all times. These new features make the S-9360 the best available CD-SEM for a wide range of applications. The S-9360 is not only an R&D tool but also a next-generation mass production tool for the semiconductor industry.

CD SEM

Overview

Services

Manufacturers of CD SEM

Top Products for CD SEM

VERITYSEM 2

16 Listings

S-9260A

8 Listings

CG4000

5 Listings

S-9360

3 Listings