LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" SEQUEL

Description

No description

Configuration

Tool is currently still in production. Tool is in good condition. Inspect to confirm configuration and condition. C2 Single Sequel Shrink Electrical Requirements : 208 VAC, 3 phase, 5-wire Wafer Size (inches) : 8 Wafer Type : Notch Stand Alone Install RF Generator Rack SSD Serial Numbers DLCM : C2-DLCM-S0862 Module A : C2-CVDD-S0836 DLCM Signal Lamp Tower IOC Version : 4.2 Integrated SMIF Model : Asyst SMIF, LPT 2200 MAG 7 Robot Type SECS / GEMS Sequel Chamber Items Process Type : Nitride Digital Dynamics IOC Heated Valves Gate Valve Mfg & Model : Gate Valve Assy, Heated 4 Inch. Novellus RF Match Type : A.E. End Point Detector RF Generator Advanced Energy RFG5500 Advanced Energy PDX1400 Pumps Deposition Chamber Pump: Alcatel ADS 1202P Load Lock Pump: Alcatel A100L Transfer Chamber Pump: Alcatel A100L Gas Box Configuration Gas Line # Gas Flow (sccm) MFC Mfgr. MFC Model 1 SiH4 750 Horiba Z512 2 N2 5000 Unit UFC1661 3 2ND SiH4 350 Horiba Z512 4 He 10000 Unit UFC1661 5 NH3 10000 Unit UFC1661 6 He (Aux) 1000 Unit UFC1661 7 NF3 5000 Unit UFC1661 8 N2O 20000 Unit UFC1661 9 N2 12000 Unit UFC1661 10 CO2 20000 Unit UFC1661

OEM Model Description

The NOVELLUS CONCEPT TWO SEQUEL is a Reactors / MOCVD system that can produce wafer size of 8 inches. It was initially shipped in a single chamber version targeted at thin dielectric films used in volume 200mm IMD production applications.