MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size.
Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.

Mattson Technology, Inc. designs, manufactures, markets and globally supports semiconductor wafer processing equipment used in the fabrication of integrated circuits. Supplier of plasma and rapid thermal processing (RTP) equipment to the global semiconductor industry, and operate in four primary product sectors: Dry Strip, Etch, Rapid Thermal Processing and Millisecond Anneal.

MATTSON

ASPEN II

instructions.pdf

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Aspen2_Configuration.pdf

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1644425645918282.mp4

Mattson Aspen II(1).docx

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load unit(stage Unit)
 trasnfer unit(robot & controller, power supply)
 process unit (matcher, generator,stage,process kits, CM)

trasnfer unit(robot controller, power supply)
 process unit (matcher, generator,stage,process kits, CM)

ASPEN II

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