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LAURELL WS-650MZ-23NPP
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    Configuration
    Laurell EDC-650-15NPP Etch Develop Clean Process Spinner. This advanced research and development tool is flexible, safe and affordable. The EDC series is typically employed for both solvent and aqueous-based processing: Etch-Rinse-Dry, Develop-Rinse-Dry, as well as solvent and aqueous cleaning. The spin processor features zero-porosity Teflon® fluid path with an onboard dispense valve manifold. A clear ECTFE dome shaped lid allows safe visibility of your process as it runs, even during single step process development mode. FULLY TESTED AND READY TO SHIP.
    OEM Model Description
    None Provided
    Documents

    No documents

    LAURELL

    WS-650MZ-23NPP

    verified-listing-icon

    Verified

    CATEGORY

    Coater Only
    Last Verified: Over 60 days ago
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    20554

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

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    LAURELL WS-650MZ-23NPP
    LAURELLWS-650MZ-23NPPCoater Only
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    LAURELL

    WS-650MZ-23NPP

    verified-listing-icon

    Verified

    CATEGORY

    Coater Only
    Last Verified: Over 60 days ago
    listing-photo-q-STnvlAvutiKCbvDUkiGs34bbhsU1ECOjSN2lHbWjc-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/8GpEvJPy2xR_VLuMDsOOL12hQo47IOv-tZ0jmsJltK0/q-STnvlAvutiKCbvDUkiGs34bbhsU1ECOjSN2lHbWjc/OhQf1ABRQM5-bR6SOD4GD3IMp9ACg3j_2EL3cRkYuWg_20190706_111140_f
    listing-photo-q-STnvlAvutiKCbvDUkiGs34bbhsU1ECOjSN2lHbWjc-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/8GpEvJPy2xR_VLuMDsOOL12hQo47IOv-tZ0jmsJltK0/q-STnvlAvutiKCbvDUkiGs34bbhsU1ECOjSN2lHbWjc/ULpmfruuXioQ1itVCxSk8f0feBpjPem68_BUGrWv6Z8_20190706_111140_f
    listing-photo-q-STnvlAvutiKCbvDUkiGs34bbhsU1ECOjSN2lHbWjc-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/8GpEvJPy2xR_VLuMDsOOL12hQo47IOv-tZ0jmsJltK0/q-STnvlAvutiKCbvDUkiGs34bbhsU1ECOjSN2lHbWjc/lVbT19OgJxOi8cW36ddWdqecC3w5JYrHU9JlL-i79d8_20190706_111140_f
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    20554

    Wafer Sizes:

    Unknown

    Vintage:

    Unknown

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Laurell EDC-650-15NPP Etch Develop Clean Process Spinner. This advanced research and development tool is flexible, safe and affordable. The EDC series is typically employed for both solvent and aqueous-based processing: Etch-Rinse-Dry, Develop-Rinse-Dry, as well as solvent and aqueous cleaning. The spin processor features zero-porosity Teflon® fluid path with an onboard dispense valve manifold. A clear ECTFE dome shaped lid allows safe visibility of your process as it runs, even during single step process development mode. FULLY TESTED AND READY TO SHIP.
    OEM Model Description
    None Provided
    Documents

    No documents

    Similar Listings
    View All
    LAURELL WS-650MZ-23NPP
    LAURELL
    WS-650MZ-23NPP
    Coater OnlyVintage: 0Condition: UsedLast Verified: Over 60 days ago