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LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" DUAL SEQUEL
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    Key Item Details

    Condition:Used

    Operational Status:

    Product ID:18871

    Wafer Sizes:8"/200mm

    Vintage:2010

    Description

    No description available

    Configuration

    Tool is currently still in production. Tool is in good condition. Inspect to confirm configuration and condition. <b>C2 Dual Sequel Shrink</b> Electrical Requirements: 208 VAC, 3 phase, 5-wire Wafer Size (inches) : 8  Wafer Type : Notch Stand Alone Install RF Generator Rack SSD   Serial Numbers: Module A : DCVD     Serial Number : 01-8-C26291     Module B : DCV2      Serial Number : 01-12-C26315       DLCM Serial Number : 02-15-C26440   <b>DLCM</b> Signal Lamp Tower  IOC Version : 4.2 Integrated SMIF       SMIF Loader Make/Model : Asyst SMIF, LPI 2200 MAG 7 Robot Type SECS / GEMS  <b>Sequel Chambers     </b> Process Type : AHM Digital Dynamics IOC  Heated Valves  Gate Valve Mfg &amp; Model : Gate Valve Assy, Heated 4 Inch. Novellus RF Match Type : A.E.  End Point Detector  RF Generators      Advanced Energy     RFG5500      Advanced Energy     PDX1400 <b>Pumps </b> Deposition Chamber Pump:  Alcatel ADS 1202P Load Lock Pump: Alcatel A100L Transfer Chamber Pump: Alcatel A100L <b>Gas Box Configuration</b> Gas Line #    Gas          Flow (sccm)        MFC Mfgr.      MFC Model 1                    SiH4        750                      Horiba            Z512 2                     N2          10000                  Unit                UFC1661 3                     C2H2      5000                    Horiba            Z512 4                      He         10000                   Unit                UFC1661 5                      NH3       8000                     Unit               UFC1661 6                      He         10000                    Unit               UFC1661 7                      O2         15000                    Unit               UFC1661 8                      NF3       2000                      Unit               UFC1661 9                      N2O       20000                    Unit               UFC1661 10                    N2         15000                     Unit               UFC1661  

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    OEM Model Description

    The NOVELLUS CONCEPT TWO DUAL SEQUEL is a system that uses reactive ion-beam deposition to deposit thick films onto wafers. It has two process chambers that can provide the throughput power of twelve stations, resulting in dramatic improvements in productivity for these types of films. It is designed for high throughput deposition of thick films, such as layers before CMP (chemical-mechanical planarization), and dual layer passivation films. It also offers dual-beam operation for increased wafer-to-wafer uniformity and higher deposition rates, as well as process control capabilities and versatile materials handling for a wide range of applications.

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