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THERMOFISHER SCIENTIFIC / FEI / PHILLIPS FIB 200
    Description
    No description
    Configuration
    The FEI FIB 200-P uses the pre-lens ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication, nanoprototyping and MEMS. • Pre-lens column 5-30kV, with excellent beam profile and stability • Milling Power: 11nA beam current • CDEM for ions and electron images with 7nm image resolution • Windows OS and FEI UI; TSS networking computer to make IT happy • 5-axis, comp-eucentric tilt stage • Full coverage of 70mm diameter • Motorized XYXR: 50 x 50 x 25mm x n x 360° x Manual T -15° +60 • Front door load • Chamber scope for real time observation • Gas Injection System: Max 4 injectors; 2 included, chemistry of choice • Vacuum System: column IGP, air cooled Turbo and mechanical PVP
    OEM Model Description
    The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.
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    THERMOFISHER SCIENTIFIC / FEI / PHILLIPS

    FIB 200

    verified-listing-icon

    Verified

    CATEGORY

    FIB
    Last Verified: Over 60 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    14242


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    THERMOFISHER SCIENTIFIC / FEI / PHILLIPS

    FIB 200

    verified-listing-icon

    Verified

    CATEGORY

    FIB
    Last Verified: Over 60 days ago
    listing-photo-a293a62a7459877c47687e2b576cc1ee115bc7a4fce0715903408598c01cda64-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/yi25nS7d6xPpNcD1HoDOVV2iUshz-4lphGKoARjROfk/a293a62a7459877c47687e2b576cc1ee115bc7a4fce0715903408598c01cda64/2cc1b7ce1cadf13b0b7044c997e156eec18fa387aa524202c37602f23667ce4f_20200429_101501_f
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    14242


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    The FEI FIB 200-P uses the pre-lens ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication, nanoprototyping and MEMS. • Pre-lens column 5-30kV, with excellent beam profile and stability • Milling Power: 11nA beam current • CDEM for ions and electron images with 7nm image resolution • Windows OS and FEI UI; TSS networking computer to make IT happy • 5-axis, comp-eucentric tilt stage • Full coverage of 70mm diameter • Motorized XYXR: 50 x 50 x 25mm x n x 360° x Manual T -15° +60 • Front door load • Chamber scope for real time observation • Gas Injection System: Max 4 injectors; 2 included, chemistry of choice • Vacuum System: column IGP, air cooled Turbo and mechanical PVP
    OEM Model Description
    The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.
    Documents

    No documents

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