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DESPATCH LCB
    Description
    No description
    Configuration
    Despatch Batch Magnetic Vacuum Annealing Oven. The oven body exterior sides and rear wall are constructed of polished 18 gauge non-magnetic stainless steel with a No. 4 finish. Permanent magnet is located between the inner and outer oven walls. Wafer Capacity (6 in. dia.): 15 max., one per tray. Operating Temp. Range: 60 deg C (140 deg F) to 300 deg C (572 deg F). Max. Design Temp.: 300 deg C (572 deg F). Heating Medium: Air/Nitrogen. Temp. Ramp Rate: Up to 5 deg C (9 deg F)/minute. Wafer temperature uniformity during temperature ramp within +/-2 deg C. Wafer temperature uniformity during stable soak conditions within +/-1 deg C. Vacuum Level: 50 mTorr.
    OEM Model Description
    None Provided
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    DESPATCH

    LCB

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    Verified

    CATEGORY

    Oven
    Last Verified: Over 60 days ago
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    15266


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    DESPATCH

    LCB

    verified-listing-icon

    Verified

    CATEGORY

    Oven
    Last Verified: Over 60 days ago
    listing-photo-CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/8GpEvJPy2xR_VLuMDsOOL12hQo47IOv-tZ0jmsJltK0/CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0/m79SqbJ302esRiC_tm7ulItY9QRXas88vbCKaFLP9YA_20190301_114802_f
    listing-photo-CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/8GpEvJPy2xR_VLuMDsOOL12hQo47IOv-tZ0jmsJltK0/CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0/g216HMFIK4fkbwquK_3gIt2rkotuSGAKTiNxWidXzmo_20190301_114802_f
    listing-photo-CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/8GpEvJPy2xR_VLuMDsOOL12hQo47IOv-tZ0jmsJltK0/CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0/-UOKhPDbDbq67KWr4kJorsDAk8yqieab0GWs3d-qmXk_20190301_114802_f
    listing-photo-CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/8GpEvJPy2xR_VLuMDsOOL12hQo47IOv-tZ0jmsJltK0/CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0/NT2XU-DVu5ulWvdQyKH8Ah331e-tojQR7CwpFRQ93aE_20190301_114802_f
    listing-photo-CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/8GpEvJPy2xR_VLuMDsOOL12hQo47IOv-tZ0jmsJltK0/CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0/vysveryhzvICj4cO_3DhJaGffH0y4SeGGRSPcjF2Gy4_20190301_114802_f
    listing-photo-CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/8GpEvJPy2xR_VLuMDsOOL12hQo47IOv-tZ0jmsJltK0/CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0/p38hqTy9Mnlf-DihjUh7ef7YSHhQHIEOoycAIbwPfNU_20190301_114802_f
    listing-photo-CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/8GpEvJPy2xR_VLuMDsOOL12hQo47IOv-tZ0jmsJltK0/CkCu7gfBfrhbtJ4qEjhppdwpjW7GNdDBFuwLxnMrkF0/HF9oPVCmx5HODCaEo0e0yXcEsnSulM6iKTXzbv-Zyn4_20190301_114802_f
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    15266


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Despatch Batch Magnetic Vacuum Annealing Oven. The oven body exterior sides and rear wall are constructed of polished 18 gauge non-magnetic stainless steel with a No. 4 finish. Permanent magnet is located between the inner and outer oven walls. Wafer Capacity (6 in. dia.): 15 max., one per tray. Operating Temp. Range: 60 deg C (140 deg F) to 300 deg C (572 deg F). Max. Design Temp.: 300 deg C (572 deg F). Heating Medium: Air/Nitrogen. Temp. Ramp Rate: Up to 5 deg C (9 deg F)/minute. Wafer temperature uniformity during temperature ramp within +/-2 deg C. Wafer temperature uniformity during stable soak conditions within +/-1 deg C. Vacuum Level: 50 mTorr.
    OEM Model Description
    None Provided
    Documents

    No documents

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