Verified
193 nm Step and Scan
Last Verified:Over 60 days ago
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Verified
Last Verified:Over 60 days ago
Condition:Used
Operational Status:
Product ID:24050
Wafer Sizes:12"/300mm
Vintage:2003
No description available
-Exposing source: KrF(Wavelength 248nm、Cymer ELS-7300) -Laser on another floor -Right side only Console -Surface illumination (standard): 36000[W/㎡]or more -R Type Inline direction -Reduction ratio: 1:4 -Throughput: AGA 8shot 110wafer/hour or more ※Step pitch 26nm×33mm,64 shot (300mm wafers) Exposure amount 300J/m2 -Resolution: 120nm or less -Alignment accuracy: 20nm or less (M+ 3σ) -Lighting NA: Three equipped with Squeezing ①NA:0.80/σ0.80 CONV ②NA:0.80/σ0.40 CONV ③NA:0.80/SiB2 -Projection lens NA: Variable 0.55~0.80 -Exposure range (Scan Field):26×33mm -Wafer alignment: AGA(Off Axis Scope) -Reticle library: Max7sheet -Cool plate before exposure(WTC): None -Options: 6"PPC Unit、6"Reticle Barcode Reader(2D)、Signal Tower(4color)、Relay FOUP Unit
The CANON FPA 5000 ES4 scanner is geared for both 200mm and 300mm wafer fabs. This lithography system is suitable for applications at the 100-nm (0.10-micron) and below. The FPA 5000-ES4 has high-throughput rates of 110 wafers per hour (wph) on 300mm and 160wph on 200mm. The s an expansion of Canon's high NA, 248-nm tools for mix-and-match applications
Verified
Last Verified:Over 60 days ago
Condition:Used
Operational Status:
Product ID:24050
Wafer Sizes:12"/300mm
Vintage:2003
No description available
-Exposing source: KrF(Wavelength 248nm、Cymer ELS-7300) -Laser on another floor -Right side only Console -Surface illumination (standard): 36000[W/㎡]or more -R Type Inline direction -Reduction ratio: 1:4 -Throughput: AGA 8shot 110wafer/hour or more ※Step pitch 26nm×33mm,64 shot (300mm wafers) Exposure amount 300J/m2 -Resolution: 120nm or less -Alignment accuracy: 20nm or less (M+ 3σ) -Lighting NA: Three equipped with Squeezing ①NA:0.80/σ0.80 CONV ②NA:0.80/σ0.40 CONV ③NA:0.80/SiB2 -Projection lens NA: Variable 0.55~0.80 -Exposure range (Scan Field):26×33mm -Wafer alignment: AGA(Off Axis Scope) -Reticle library: Max7sheet -Cool plate before exposure(WTC): None -Options: 6"PPC Unit、6"Reticle Barcode Reader(2D)、Signal Tower(4color)、Relay FOUP Unit
The CANON FPA 5000 ES4 scanner is geared for both 200mm and 300mm wafer fabs. This lithography system is suitable for applications at the 100-nm (0.10-micron) and below. The FPA 5000-ES4 has high-throughput rates of 110 wafers per hour (wph) on 300mm and 160wph on 200mm. The s an expansion of Canon's high NA, 248-nm tools for mix-and-match applications
Moov goes beyond the transaction to ensure a seamless buying experience from start to finish.
Money Back Guarantee
Let Moov take the risk out of purchasing secondhand equipment with our 'No questions asked Money Back Guarantee' Learn more
Logistics
One stop shop for Moov-ing equipment anywhere globally.
Insurance
Moov-ing equipment can be risky. Let us take on that risk so you can relax while your equipment is in transit.
Refurbishment
Need a tool built to the required specifications? Moov's refurbishment team has over 20 years of experience.