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CANON FPA-5000ES4
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    Key Item Details

    Condition:Used

    Operational Status:

    Product ID:24050

    Wafer Sizes:12"/300mm

    Vintage:2003

    Description

    No description available

    Configuration

    -Exposing source: KrF(Wavelength 248nm、Cymer ELS-7300) -Laser on another floor -Right side only Console -Surface illumination (standard): 36000[W/㎡]or more -R Type Inline direction -Reduction ratio: 1:4 -Throughput: AGA 8shot 110wafer/hour or more ※Step pitch 26nm×33mm,64 shot (300mm wafers) Exposure amount 300J/m2 -Resolution: 120nm or less -Alignment accuracy: 20nm or less (M+ 3σ) -Lighting NA: Three equipped with Squeezing ①NA:0.80/σ0.80 CONV ②NA:0.80/σ0.40 CONV ③NA:0.80/SiB2 -Projection lens NA: Variable 0.55~0.80 -Exposure range (Scan Field):26×33mm -Wafer alignment: AGA(Off Axis Scope) -Reticle library: Max7sheet -Cool plate before exposure(WTC): None -Options: 6"PPC Unit、6"Reticle Barcode Reader(2D)、Signal Tower(4color)、Relay FOUP Unit

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    OEM Model Description

    The CANON FPA 5000 ES4 scanner is geared for both 200mm and 300mm wafer fabs. This lithography system is suitable for applications at the 100-nm (0.10-micron) and below. The FPA 5000-ES4 has high-throughput rates of 110 wafers per hour (wph) on 300mm and 160wph on 200mm. The s an expansion of Canon's high NA, 248-nm tools for mix-and-match applications

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