Description
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PolyGen Chamber Single wf Boron doped poly deposition @ reduced pressure (gas: B2H6, SiH4; pressure 275 Torr; temperature: 730 C) Chamber: POLYgen 200 TPCC The chamber was UP and running before decommissioning, installed on AMAT CENTURA mainframe in position “D”OEM Model Description
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTPDocuments
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APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
Verified
CATEGORY
Epitaxial deposition (EPI)
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
27602
Wafer Sizes:
Unknown
Vintage:
Unknown
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View AllAPPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
Verified
CATEGORY
Epitaxial deposition (EPI)
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
27602
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
PolyGen Chamber Single wf Boron doped poly deposition @ reduced pressure (gas: B2H6, SiH4; pressure 275 Torr; temperature: 730 C) Chamber: POLYgen 200 TPCC The chamber was UP and running before decommissioning, installed on AMAT CENTURA mainframe in position “D”OEM Model Description
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTPDocuments
No documents