Description
Tool is still running production.Configuration
Gas Configuration Gas Type BF3 : SDS PH3 : SDS AsH3 : SDS External Facilities Connections : Ar | N2 Loading Configuration: SMIF Electrical Requirements : 208V / 250A GEM/SECS Interface : Yes SECS II Interface : Yes Energy Range : 80KeV Through Wafer – Wafer on Blade Sensor : Yes Hollow Gripper : Yes PEEK Moving Clips : Yes Ion Source Type : Bernas Plasma Flood System : Standard Source Material Type : Tungsten Arc Chamber Front Plate : Split Graphite Dual Vaporizers : No Post-Acceleration Tube/Turbo Pump : Leybold Process Chamber/Cryopumps : CTI OB10OEM Model Description
The Precision Implant xR80 was introduced in October 1995. It features low-energy and a very small system footprint while maintaining high throughput.Documents
No documents
APPLIED MATERIALS (AMAT)
xR80
Verified
CATEGORY
High Current
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
16512
Wafer Sizes:
Unknown
Vintage:
2014
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Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
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APPLIED MATERIALS (AMAT)
xR80
Verified
CATEGORY
High Current
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
16512
Wafer Sizes:
Unknown
Vintage:
2014
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Tool is still running production.Configuration
Gas Configuration Gas Type BF3 : SDS PH3 : SDS AsH3 : SDS External Facilities Connections : Ar | N2 Loading Configuration: SMIF Electrical Requirements : 208V / 250A GEM/SECS Interface : Yes SECS II Interface : Yes Energy Range : 80KeV Through Wafer – Wafer on Blade Sensor : Yes Hollow Gripper : Yes PEEK Moving Clips : Yes Ion Source Type : Bernas Plasma Flood System : Standard Source Material Type : Tungsten Arc Chamber Front Plate : Split Graphite Dual Vaporizers : No Post-Acceleration Tube/Turbo Pump : Leybold Process Chamber/Cryopumps : CTI OB10OEM Model Description
The Precision Implant xR80 was introduced in October 1995. It features low-energy and a very small system footprint while maintaining high throughput.Documents
No documents
Similar Listings
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