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AMAT / APPLIED MATERIALS Centura AP Ultima X

Created On
October 21st, 2020
Guaranteed Accurate as of
21 days ago
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October 21st, 2020
21 days ago
Copied!
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Product ID
27358
Make
AMAT / APPLIED MATERIALS
Model
Centura AP Ultima X
Category
Reactors / MOCVD
Quantity
Not In Stock
Serial Number
-
Vintage
2005
Wafer Size
12"/300mm
Condition
As-Is
Other Information
Configuration
[Chamber A] Chamber Type:Ultima X HDP CVD Gas Config(sccm)=MFC Full Scale O2(1000)/NF3(100)/He(600)/SiH4((300)/H2(1000)/AR(1000)/H2(1000)/SiH4(50)/He(400)/AR(100)/NF3(3000)/AR(3000) RF Source 1.8-2.17MHz, max 10000 W RF Bias 13.56MHz, max 9500W RF RPS 400kHz, max 6000W [Chamber B] Chamber Type:Ultima X HDP CVD Gas Config(sccm)=MFC Full Scale O2(1000)/NF3(100)/He(600)/SiH4((300)/H2(1000)/AR(1000)/H2(1000)/SiH4(50)/He(400)/AR(100)/NF3(3000)/AR(3000) RF Source 1.8-2.17MHz, max 10000 W RF Bias 13.56MHz, max 9500W RF RPS 400kHz, max 6000W [Chamber C] Chamber Type:Ultima X HDP CVD Gas Config(sccm)=MFC Full Scale O2(1000)/NF3(100)/He(600)/SiH4((300)/H2(1000)/AR(1000)/H2(1000)/SiH4(50)/He(400)/AR(100)/NF3(3000)/AR(3000) RF Source 1.8-2.17MHz, max 10000 W RF Bias 13.56MHz, max 9500W RF RPS 400kHz, max 6000W Tool is running both IMD and PMD Processes.
Description
HDP CVD (Chemical Vapor Deposition) A HARD DISK DRIVE WILL BE REMOVED FROM TOOL. Other missing or damaged parts: Not reported.
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OEM Model Description
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