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AIXTRON AIX 2800 G4 HT
    Description
    No description
    Configuration
    Type: GaN MOCVD Version: 2 INCH x 42, 4 INCH x 11, 6 INCH x 6 Capacity: 6"×6 or 4"×11 or 2"×24 Susceptor dimension: D520mm×T19mm Chamber coil (9 channels) Hydride Line : 1xNH3, 2xDopant Purifier: H2, N2, NH3 Pump : DOR pump(SH-110), Ebara pump(ESA70) With: H2 Purifier (IN LINE Type) Maker TERATECH Model TPH-LP-500S(100S) Gas: Hydrogen Process Methods: Line Purifier Flow Rate(Nm³/hr) : 10.30.50.75.100.150.300 Impurities Removed: H₂.O₂.H₂O.CO.CO₂
    OEM Model Description
    The AIXTRON AIX 2800 G4 HT (High-Temperature) is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. It is designed specifically for high-temperature processing and the epitaxial growth of compound semiconductor materials.
    Documents

    No documents

    AIXTRON

    AIX 2800 G4 HT

    verified-listing-icon

    Verified

    CATEGORY

    MOCVD
    Last Verified: Over 60 days ago
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    24142

    Wafer Sizes:

    Unknown

    Vintage:

    2010

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    AIXTRON AIX 2800 G4 HT
    AIXTRONAIX 2800 G4 HTMOCVD
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    AIXTRON

    AIX 2800 G4 HT

    verified-listing-icon

    Verified

    CATEGORY

    MOCVD
    Last Verified: Over 60 days ago
    listing-photo-3b5f3d11d70f43d8988aac21d9870c7e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/32194/3b5f3d11d70f43d8988aac21d9870c7e/0b8909abb51e4aa2848fb51a61c937d2_2_f.jpeg
    listing-photo-3b5f3d11d70f43d8988aac21d9870c7e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/32194/3b5f3d11d70f43d8988aac21d9870c7e/653e074ded22436399be72fa70b1e916_1_f.jpeg
    listing-photo-3b5f3d11d70f43d8988aac21d9870c7e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/32194/3b5f3d11d70f43d8988aac21d9870c7e/63c020e9c0464e44bea35343ea8af6c5_4_f.jpeg
    listing-photo-3b5f3d11d70f43d8988aac21d9870c7e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/32194/3b5f3d11d70f43d8988aac21d9870c7e/cefba0dd70c04532bb2d804f894292a7_3_f.jpeg
    listing-photo-3b5f3d11d70f43d8988aac21d9870c7e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/32194/3b5f3d11d70f43d8988aac21d9870c7e/d697f64b436a4116a04387ed128377f9_6_f.jpeg
    listing-photo-3b5f3d11d70f43d8988aac21d9870c7e-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/32194/3b5f3d11d70f43d8988aac21d9870c7e/b66ea9f32494437a84999b90f1d275dd_5_f.jpeg
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    24142

    Wafer Sizes:

    Unknown

    Vintage:

    2010

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Type: GaN MOCVD Version: 2 INCH x 42, 4 INCH x 11, 6 INCH x 6 Capacity: 6"×6 or 4"×11 or 2"×24 Susceptor dimension: D520mm×T19mm Chamber coil (9 channels) Hydride Line : 1xNH3, 2xDopant Purifier: H2, N2, NH3 Pump : DOR pump(SH-110), Ebara pump(ESA70) With: H2 Purifier (IN LINE Type) Maker TERATECH Model TPH-LP-500S(100S) Gas: Hydrogen Process Methods: Line Purifier Flow Rate(Nm³/hr) : 10.30.50.75.100.150.300 Impurities Removed: H₂.O₂.H₂O.CO.CO₂
    OEM Model Description
    The AIXTRON AIX 2800 G4 HT (High-Temperature) is an advanced metal-organic chemical vapor deposition (MOCVD) system developed by AIXTRON SE. It is designed specifically for high-temperature processing and the epitaxial growth of compound semiconductor materials.
    Documents

    No documents

    Similar Listings
    View All
    AIXTRON AIX 2800 G4 HT
    AIXTRON
    AIX 2800 G4 HT
    MOCVDVintage: 2010Condition: UsedLast Verified: 27 days ago
    AIXTRON AIX 2800 G4 HT
    AIXTRON
    AIX 2800 G4 HT
    MOCVDVintage: 2010Condition: UsedLast Verified: Over 60 days ago