NOVA

NOVASCAN 3090

T600	

A wide range of 2D/3D and in-die metrology solutions for Dielectric and Copper CMP, Photolithography, Etch and CVD

NS3090Next SA

V2600

i550R

I500

NOVESCAN 3060 SA

The NovaScan 2040 and 3060 have an overall measurement time of 13 seconds per wafer for 13 sites, compatible with all high-throughput polishers, enabling measurement and mapping of all wafers both pre- and post-polish without affecting the polisher’s throughput. Nova is the only Integrated Metrology provider to offer both wet and dry integrations allowing customers to choose the best alternative. The NovaScan 2040/3060 utilizes UV Spectrophotometry to accurately measure and map the most advanced applications in the semiconductor industry down to the 0.09µm technology node.

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NOVASCAN 3090

T600

V2600

NS3090Next SA

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